Plasma Chemistry and Plasma Processing is an international journal that provides a forum for the publication of original papers on fundamental research and new developments in plasma chemistry and plasma processing. The journal encompasses all types of industrial processing plasmas, ranging from nonthermal plasmas to thermal plasmas, and publishes fundamental plasma studies as well as studies of specific plasma applications. Application contexts of interest include plasma etching in microelectronics and other fields, deposition of thin films and coatings, powder synthesis, environmental processing, lighting, surface modification and others. Includes studies of chemical kinetics in plasmas, and the interactions of plasmas with surfaces.

《等離子體化學與等離子體處理》是一份國際期刊，為發表有關等離子體化學與等離子體處理的基礎研究和新進展的原始論文提供了一個論壇。該雜志涵蓋了所有類型的工業加工等離子體，從非熱等離子體到熱等離子體，并出版了基礎等離子體研究以及特定等離子體應用的研究。感興趣的應用領域包括微電子和其他領域的等離子體蝕刻、薄膜和涂層的沉積、粉末合成、環境處理、照明、表面改性等。包括等離子體的化學動力學研究，以及等離子體與表面的相互作用。